Copper Electrodeposition Kinetics Measured by Alternating Current Voltammetry and the Role of Ferrous Species
Author
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Wagner, Mary-Elizabeth
Author
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Valenzuela, Rodrigo
Author
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Vargas Valero, Tomás
Author
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Colet Lagrille, Melanie
Author
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Allanore, Antoine
Admission date
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2016-01-27T19:47:08Z
Available date
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2016-01-27T19:47:08Z
Publication date
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2016
Cita de ítem
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Journal of The Electrochemical Society, 163 (2) D17-D23 (2016)
en_US
Identifier
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DOI: 10.1149/2.0121602jes
Identifier
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https://repositorio.uchile.cl/handle/2250/136807
General note
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Artículo de publicación ISI
en_US
Abstract
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Impurities and additives play a key role in copper electrodeposition, in particular in upstream processes such as electrowinning or electrorefining. One common impurity is iron, mostly present as iron species Fe(II) in highly concentrated sulfuric acid solutions and in a cathodic environment. Herein, the kinetics of copper electrodeposition from such solutions have been investigated using a copper rotating disk electrode and alternating current voltammetry (ACV). For a concentration of proton of 1.84 M and a concentration of Fe(II) ions of 0.054 M, the deposition kinetics are slow enough to separately observe the two electron transfer steps involved in copper reduction: an observation unique to ACV. The results suggest that Fe(II) ions affect the electrodeposition kinetic by slowing down reaction kinetics, in particular slowing the second electron transfer reaction.