Nanocrystalline carbon flakes deposited by RF magnetron sputtering
Author
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Guzmán Olivos, Fernando
Author
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Espinoza González, Rodrigo
Author
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Fuenzalida Escobar, Víctor
Admission date
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2016-06-13T16:08:40Z
Available date
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2016-06-13T16:08:40Z
Publication date
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2016
Cita de ítem
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Materials Letters 167 (2016) 242–245
en_US
Identifier
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DOI: 10.1016/j.matlet.2016.01.016
Identifier
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https://repositorio.uchile.cl/handle/2250/138748
General note
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Artículo de publicación ISI
en_US
Abstract
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Carbon nanostructures were prepared by RF magnetron sputtering at deposition times from 30 to 120 min and temperatures on silicon substrates from 390 degrees C to 510 degrees C. Scanning and transmission electron microscopy (TEM) observations showed that carbon films deposited at 510 C consisted of nanostructured polycrystalline carbon nanoflakes. Dark field TEM images showed carbon nanocrystals of 1 nm average size. The sp(2) hybridization decreases with increasing deposition time, as it was confirmed by X-ray photoelectron spectroscopy. The nature of these carbon nanostructures would be turbostratics, an intermediate state between hexagonal and amorphous phases.