Morphological and electrical study of gold ultrathin films on mica
Author
dc.contributor.author
Bahamondes, S.
Author
dc.contributor.author
Donoso, S.
es_CL
Author
dc.contributor.author
Henríquez, R.
es_CL
Author
dc.contributor.author
Flores Carrasco, Marcos
es_CL
Admission date
dc.date.accessioned
2014-01-09T18:45:59Z
Available date
dc.date.available
2014-01-09T18:45:59Z
Publication date
dc.date.issued
2013
Cita de ítem
dc.identifier.citation
Thin Solid Films 548 (2013) 646–649
en_US
Identifier
dc.identifier.other
DOI: 10.1016/j.tsf.2013.08.104
Identifier
dc.identifier.uri
https://repositorio.uchile.cl/handle/2250/126135
General note
dc.description
Artículo de publicación ISI
en_US
Abstract
dc.description.abstract
We present a topographical study of the formation of thin films of gold on muscovite mica. The characterization
of the samples was done with scanning tunneling microscopy, atomic force microscopy as well as electric
measurements.We performed our study on two groups of samples: first group of samples, evaporated at room
temperature for thickness ranging from 1.5 up to 97 nm; second group of samples, for two different thicknesses
of 3 nmand 50 nmevaporated at different substrate temperatures, between 110 and 530 K. The gold films show
a Volmer–Weber growth. The complete films are obtained from samples with a nominal thickness of 8 nm
deposited. The average grain diameter is constant, with nominal thicknesses of 18.5 nm, up to 8 nm and
increases with the thickness for higher deposition. The average grain diameter is similar regardless of the
temperature of the substrate for samples of 3 nm thickness, but changes for samples of 50 nm thickness.
The resistivity is inversely dependent on nominal thickness and the mean free path is lineally dependent
on nominal thickness.