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Authordc.contributor.authorHerrera N., Villalon J., Munoz G., Baez G.
Admission datedc.date.accessioned2022-12-27T14:03:18Z
Available datedc.date.available2022-12-27T14:03:18Z
Publication datedc.date.issued2020
Identifierdc.identifier.other10.1109/ICALT49669.2020.00041
Identifierdc.identifier.urihttps://repositorio.uchile.cl/handle/2250/190788
Lenguagedc.language.isoen
Publisherdc.publisherInstitute of Electrical and Electronics Engineers Inc.
Type of licensedc.rightsAttribution-NonCommercial-NoDerivs 3.0 Chile
Link to Licensedc.rights.urihttp://creativecommons.org/licenses/by-nc-nd/3.0/cl/
Sourcedc.sourceProceedings - IEEE 20th International Conference on Advanced Learning Technologies, ICALT 2020
Títulodc.titleAleph: An indicator of decision-making patterns within collaborative marking sessions for writing assessment that can predict reliability
Document typedc.typeArtículo de revista
Catalogueruchile.catalogadorSCOPUS
Indexationuchile.indexArtículo de publicación ISI
Indexationuchile.indexArtículo de publicación SCOPUS
Indexationuchile.indexArtículo de publicación SCIELO
uchile.cosechauchile.cosechaSI


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Attribution-NonCommercial-NoDerivs 3.0 Chile
Except where otherwise noted, this item's license is described as Attribution-NonCommercial-NoDerivs 3.0 Chile