Predicting the coverage ratio of copper electrodeposits obtained on mesh cathodes

Author	dc.contributor.author	Cifuentes, L.
Author	dc.contributor.author	Crisóstomo, G.	es_CL
Author	dc.contributor.author	Mella, M.	es_CL
Admission date	dc.date.accessioned	2008-12-22T11:37:46Z
Available date	dc.date.available	2008-12-22T11:37:46Z
Publication date	dc.date.issued	2006-11
Cita de ítem	dc.identifier.citation	MINERALS ENGINEERING Volume: 19 Issue: 13 Pages: 1385-1387 Published: NOV 2006	en
Identifier	dc.identifier.issn	0892-6875
Identifier	dc.identifier.uri	https://repositorio.uchile.cl/handle/2250/124794
Abstract	dc.description.abstract	The physical quality of electrodeposits obtained on mesh cathodes may be characterized by a coverage ratio which reflects the homogeneity of the deposit over the electrode surface. On the basis of experimental results, an expression is proposed to predict this ratio for copper electrodeposits obtained in arsenic-containing electrolytes.	en
Lenguage	dc.language.iso	en	en
Publisher	dc.publisher	PERGAMON-ELSEVIER SCIENCE LTD	en
Keywords	dc.subject	Electrometallurgy	en
Título	dc.title	Predicting the coverage ratio of copper electrodeposits obtained on mesh cathodes	en
Document type	dc.type	Artículo de revista