Show simple item record

Authordc.contributor.authorMunoz, Raúl C. 
Authordc.contributor.authorFinger, Ricardo 
Authordc.contributor.authorArenas, Claudio 
Authordc.contributor.authorKremer, German 
Authordc.contributor.authorMoraga, Luis 
Admission datedc.date.accessioned2018-12-20T14:26:49Z
Available datedc.date.available2018-12-20T14:26:49Z
Publication datedc.date.issued2002
Cita de ítemdc.identifier.citationPhysical Review B - Condensed Matter and Materials Physics, Volumen 66, Issue 20, 2018, Pages 2054011-2054019
Identifierdc.identifier.issn01631829
Identifierdc.identifier.urihttps://repositorio.uchile.cl/handle/2250/156017
Abstractdc.description.abstractWe have extended the modified formalism of Sheng, Xing, and Wang [J. Phys.: Condens. Matter 11 L299 (1999)] to allow the calculation of the conductivity of a thin metallic film bounded by a rough fractal surface. We utilized the so-called k-correlation model proposed by Palasantzas and Barnas [Phys. Rev. B 48, 14472 (1993); 56, 7726 (1997)], to describe the height-height autocorrelation function corresponding to a self-affine roughness. This extension permits the calculation of the conductivity of the film as a function of the r.m.s. roughness amplitude δ, of the lateral correlation length ξ, of the mean free path in the bulk l, and of the roughness exponent H. We found that the degree of surface irregularity, represented by the roughness exponent H characterizing the surface, does influence the conductivity of the film, as first discovered by Palasantzas and Barnas. However, this influence manifests itself for large bulk mean free paths l ≈ 1000 nm and for large correlation lengths ξ≈
Lenguagedc.language.isoen
Type of licensedc.rightsAttribution-NonCommercial-NoDerivs 3.0 Chile
Link to Licensedc.rights.urihttp://creativecommons.org/licenses/by-nc-nd/3.0/cl/
Sourcedc.sourcePhysical Review B - Condensed Matter and Materials Physics
Keywordsdc.subjectElectronic, Optical and Magnetic Materials
Keywordsdc.subjectCondensed Matter Physics
Títulodc.titleSurface-induced resistivity of thin metallic films bounded by a rough fractal surface
Document typedc.typeArtículo de revista
Catalogueruchile.catalogadorSCOPUS
Indexationuchile.indexArtículo de publicación SCOPUS
uchile.cosechauchile.cosechaSI


Files in this item

Icon

This item appears in the following Collection(s)

Show simple item record

Attribution-NonCommercial-NoDerivs 3.0 Chile
Except where otherwise noted, this item's license is described as Attribution-NonCommercial-NoDerivs 3.0 Chile