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Authordc.contributor.authorDíaz Valenzuela, Carlos es_CL
Authordc.contributor.authorValenzuela, María Luisa es_CL
Authordc.contributor.authorYutronic Sáez, Nicolás 
Authordc.contributor.authorAguirre Álvarez, Pedro es_CL
Admission datedc.date.accessioned2011-06-03T12:39:35Z
Available datedc.date.available2011-06-03T12:39:35Z
Publication datedc.date.issued2010-09-14
Cita de ítemdc.identifier.citationJournal of the Chilean Chemical Society, 55, N° 3 (2010) 415-418.es_CL
Identifierdc.identifier.issn0717-9707
Identifierdc.identifier.urihttps://repositorio.uchile.cl/handle/2250/119224
Abstractdc.description.abstractThe compounds N3P3[NH(CH2)3Si(OEt)3]6 (1), N3P3[NH(CH2)3Si(OEt)3]3[NCH3(CH2)3CN]3 (2) and N3P3[NH(CH2)3Si(OEt)3]3 [HOC6H4(CH2)CN]3 (3) undergo slow gelation at the interface oil/air at low temperatures to give perfect gels G1, G2 and G3 respectively. TEM analysis reveals nanoparticles of silica with mean size of about 10 nm. Pyrolysis under air at 800 °C of these gels affords a mixture of mainly Si5(PO4)6O, SiP2O7 and SiO2. Gelation and pyrolysis products were characterized by IR, solid-state NMR, TEM, SEM-EDAX microscopy and X-ray diffraction. The sol-gel process in the interface liquid /air is discussed in comparison with the usual sol-gel solution process.es_CL
Patrocinadordc.description.sponsorshipThis work was supported by Fondecyt projects 1085011.es_CL
Lenguagedc.language.isoenes_CL
Publisherdc.publisherChilean Chemical Societyes_CL
Keywordsdc.subjectSol-geles_CL
Títulodc.titleGELATION OF N3P3[NH(CH2)3Si(OEt)3]6-n [X]n X = NH(CH2)3Si(OEt)3, NCH3(CH2)3CN AND OC6H4(CH2)CN, n = 0 or 3 at the LIQUID/AIR/INTERFACEes_CL
Document typedc.typeArtículo de revista


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