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Authordc.contributor.authorTiznado, William 
Authordc.contributor.authorOña, Ofelia B. 
Authordc.contributor.authorCaputo, María C. 
Authordc.contributor.authorFerraro, Marta B. 
Authordc.contributor.authorFuentealba Rosas, Patricio 
Admission datedc.date.accessioned2018-12-20T14:06:11Z
Available datedc.date.available2018-12-20T14:06:11Z
Publication datedc.date.issued2009
Cita de ítemdc.identifier.citationJournal of Chemical Theory and Computation, Volumen 5, Issue 9, 2018, Pages 2265-2273
Identifierdc.identifier.issn15499618
Identifierdc.identifier.other10.1021/ct900320r
Identifierdc.identifier.urihttps://repositorio.uchile.cl/handle/2250/153846
Abstractdc.description.abstractA theoretical study of two series of small clusters, Si 3O n-and Si 6O n -(n=1-6), has been carried out. The minimum energy structures were produced adding an electron to neutral species followed by relaxation at the B3LYP-6-311G(2d) level. The vertical ionization energies (VIEs) were computed using the electron propagator theory (EPT) in two approximations, Unrestricted Outer Valence Green Functions (UOVGF) and partial third-order approximation (P3). In the series Si 3O n -the theoretical VIEs of the minimum energy structures agree well with experimental data. For the second series there are not experimental VIEs, and the theoretical results are predictions. The performance of EPT methodologies in conjunction with all-electron or pseudopotentials (PP) calculations is analyzed. The conjunction of P3 and PP approximation proves to be the most efficient and economical methodology to calculate the VIEs of small anionic silicon oxide clusters. In the series Si 6O n -different channels of f
Lenguagedc.language.isoen
Type of licensedc.rightsAttribution-NonCommercial-NoDerivs 3.0 Chile
Link to Licensedc.rights.urihttp://creativecommons.org/licenses/by-nc-nd/3.0/cl/
Sourcedc.sourceJournal of Chemical Theory and Computation
Keywordsdc.subjectComputer Science Applications
Keywordsdc.subjectPhysical and Theoretical Chemistry
Títulodc.titleTheoretical Study of the Structure and Electronic Properties of Si 3O n -and Si 6O n -(n=1-6) Clusters. Fragmentation and Formation Patterns
Document typedc.typeArtículo de revista
Catalogueruchile.catalogadorSCOPUS
Indexationuchile.indexArtículo de publicación SCOPUS
uchile.cosechauchile.cosechaSI


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Attribution-NonCommercial-NoDerivs 3.0 Chile
Except where otherwise noted, this item's license is described as Attribution-NonCommercial-NoDerivs 3.0 Chile